B Boron - Sputtering Target

Optical characteristics include transmitting portions of the infrared. Boron is a poor conductor of electricity at room temperature but a good conductor at high temperature.

Melting point: 2075 °C Boiling point: 4000 °C

A sputtering target is a disc of a high purity material used as an atomic sputtering source for ion beam bombardment. Please contact us if your required sputtertarget size and/ or purity are not listed.

Sputtering Target Sputtering Target

Boron - Sputtering Target - Your product selection

B-00100 Boron sputtering target

Details: diam. 10mm x 1mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00101 Boron sputtering target

Details: diam. 10mm x 2mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00102 Boron sputtering target

Details: diam. 10mm x 3.175mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00103 Boron sputtering target

Details: diam. 10mm x 4mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00104 Boron sputtering target

Details: diam. 10mm x 6.35mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00105 Boron sputtering target

Details: diam. 25.4mm x 1mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00106 Boron sputtering target

Details: diam. 25.4mm x 2mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00107 Boron sputtering target

Details: diam. 25.4mm x 3.175mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00108 Boron sputtering target

Details: diam. 25.4mm x 6.35mm thickness
Purity:
CAS No: [7440-42-8]
Further information: 99.9%

B-00109 Boron sputtering target

Details: diam. 50.8mm x 1mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00110 Boron sputtering target

Details: diam. 50.8mm x 2mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00111 Boron sputtering target

Details: diam. 50.8mm x 3.175mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00112 Boron sputtering target

Details: diam. 50.8mm x 6.35mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00113 Boron sputtering target

Details: diam. 76.2mm x 1mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00114 Boron sputtering target

Details: diam. 76.2mm x 2mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00115 Boron sputtering target

Details: diam. 76.2mm x 3.175mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00116 Boron sputtering target

Details: diam. 76.2mm x 6.35mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00117 Boron sputtering target

Details: diam. 101.6mm x 1mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00118 Boron sputtering target

Details: diam. 101.6mm x 2mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00119 Boron sputtering target

Details: diam. 101.6mm x 3.175mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00120 Boron sputtering target

Details: diam. 101.6mm x 6.35mm thickness
Purity: 99.9%
CAS No: [7440-42-8]
Further information:

B-00121 Boron sputtering target

Details: diam. 76,2mm x 5mm thickness
Purity: 99,9%
CAS No: [7440-42-8]
Further information:

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