Sputtering Targets

Overview

We provide one of the largest, most comprehensive lines of materials for use in sputtering systems. All popular geometries (and sizes) including rings, S-Guns and circular, rectangular and triangular and planar targets are available. Rotation sputtering targets can be custom manufactured from various materials to meet your specific application requirements. Backing plates, bonding and silver epoxy bonding cement are also available.

Materials and quality

Targets are available from a wide variety of compositions in various purity levels, allowing our customers to match targets to their specific requirements. Sputtering targets are inspected at all stages of production for composition, purity, density and finally for shape and dimensions. State-of-the-art powder mixing and/or alloying through sintering and/or melting of raw materials and subsequent grinding allow us to meet the highest quality standards. Each production lot of material is sent through various analytical processes, and a certificate of analysis provided with each shipment.

Manufacturing Processes

The specific manufacturing process used depends on the properties of the target material and the end use of the target itself. Classical and vacuum hot-pressing, cold-pressing and sintering and vacuum melting and casting are routinely employed in the production of a variety of sputtering sources.

Please contact us if your required target material and/ or purity is not listed.